Deposition Cluster  PLD System

In our deposition cluster, users can grow single- or multi-layered thin film samples with different techniques. The cluster allows transferring the samples from one of its chambers to another keeping them under UHV pressure. It consists of:

  • A Pulsed Laser Deposition (PLD) system, mostly used to grow oxides and manganites. PLD growth can be monitored by means of Reflection High-Energy Electron Diffraction (RHEED);
  • A Chemical Vapor Deposition (CVD) chamber to grow organic layers;
  • A metal evaporation chamber to grow metallic (Co, Al, Au, etc.) layers;
  • A mask exchange chamber, where masks can be applied over substrates to change the geometry of the layers;
  • A load-lock chamber to get sample in and out the cluster;
  • A central transfer chamber with a rotating, elongating arm. It serves also as storage unit
Premysl Marsik

Maître-assistant-e

Office PER 08 - 1.58B
+41 26 300 8918

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